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Date: 20 September 2014
Nano-Confinement Induced Chain Alignment in Ordered P3HT Nanostructures Defined by Nanoimprint Lithography  


Topic Name: Nano-Confinement Induced Chain Alignment in Ordered P3HT Nanostructures Defined by Nanoimprint Lithography
Category: Nanocharacterization
    
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Research persons: Mukti Aryal, Krutarth Trivedi ,Wenchuang Hu

Location: Dallas, United States

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Nano-Confinement Induced Chain Alignment in Ordered P3HT Nanostructures Defined by Nanoimprint Lithography

Control of polymer morphology and chain orientation is of great importance in
organic solar cells and field effect transistors (OFETs). Here we report the use
of nanoimprint lithography to fabricate large-area, high-density, and ordered
nanostructures in conjugated polymer poly(3-hexylthiophene) or P3HT, and also to
simultaneously control 3D chain alignment within these P3HT nanostructures.
Out-of-plane and in-plane grazing incident X-ray diffraction were used to
determine the chain orientation in the imprinted P3HT nanostructures, which
shows a strong dependence on their geometry (gratings or pillars). Vertical
chain alignment was observed in both nanogratings and nanopillars, indicating
strong potential to improve charge transport and optical properties for solar
cells in comparison to bulk heterojunction structure. For P3HT nanogratings, π−π
stacking along the grating direction with an angular distribution of ±20° was
found, which is favorable for OFETs. We propose the chain alignment is induced
by the nanoconfinement during nanoimprinting via π−π interaction and hydrophobic
interaction between polymer chain and mold surfaces.
About the researchers :


Mukti AryalKrutarth Trivedi
Wenchuang (Walter) Hu
 



Department of Electrical Engineering,
The University of Texas at Dallas, Richardson, Texas
 


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